InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching
| First author: |
Cao, M |
| Abstract: |
The intermixing effect on InAs0.45P0.55/InP strained multiple quantum wells (SMQWs) by inductively coupled plasma (ICP) etching and rapid thermal annealing (RTA) is investigated. Experiments show that the process of ICP etching followed RTA induces the blue shift of low temperature photoluminescence (PL) peaks of QWs. With increasing etching depth, the PL intensities are firstly enhanced and then diminished. This phenomenon is attributed to the variation of surface roughness and microstructure transformation inside the QW structure during ICP processing. (C) 2009 Elsevier Ltd. All rights reserved.
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12 |
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2009-12-1 |
| Volume: |
44 |
| Unit code: |
172231 |
| Publication name: |
MATERIALS RESEARCH BULLETIN |
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