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Characterization of anti-adhesive self-assembled monolayer for nanoimprint lithography
First author: Zhou, Weimin (1)
Abstract: In nanoimprint lithography process, resist adhesion to the mold was usually self-assembled and a release agent on the mold surface to detach easily from the imprinted resist. In the paper, the commercially available silane, 1H,1H,2H,2H-perfluorodecyltrich
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Page number: 2885-2889
Issue: 5
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PubYear: 2008-12-30
Volume: 255
Unit code: 172231
Publication name: Applied Surface Science
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Paper type: Journal article (JA)
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ISSN: (1) Laboratory for Nano Sciences and Technologies, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China; (2) School of Materials Science and Technology, Central South University, Changsha, 4100